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Cited article:

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Nuclear Engineering and Design 403 112150 (2023)
https://doi.org/10.1016/j.nucengdes.2022.112150

Thermodynamic study, compositional and electrical characterization of LPCVD SiO2 films grown from TEOS/N2O mixtures

V.Em. Vamvakas, D. Davazoglou and C. Vahlas
Microelectronics Reliability 38 (2) 265 (1998)
https://doi.org/10.1016/S0026-2714(97)00036-X

System SiAlMgO: Thermodynamic aspects of its influence on the oxidation resistance of silicon carbide at high temperature

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Journal of the European Ceramic Society 14 (1) 53 (1994)
https://doi.org/10.1016/0955-2219(94)90044-2