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Cited article:

Une nouvelle technologie d'appareils de dépôt chimique en phase vapeur. Partie 2 : Modélisation du dépôt de silicium pur à partir de silane et de silicium dopé in situ au phosphore

Huges Vergnes, Patrick Duverneuil and Jean‐Pierre Couderc
The Canadian Journal of Chemical Engineering 78 (4) 803 (2000)
https://doi.org/10.1002/cjce.5450780425

Mechanism of the silane decomposition. I. Silane loss kinetics and rate inhibition by hydrogen. II. Modeling of the silane decomposition (all stages of reaction)

R. T. White, R. L. Espino‐Rios, D. S. Rogers, M. A. Ring and H. E. O'Neal
International Journal of Chemical Kinetics 17 (10) 1029 (1985)
https://doi.org/10.1002/kin.550171003