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Cited article:

Electron and helium ion yield XAFS of sputter-deposited iron silicide thin films

M. Takahashi, I. Watanabe, M. Harada and F. Kanamaru
Physica B: Condensed Matter 208-209 565 (1995)
https://doi.org/10.1016/0921-4526(94)00752-H