Thermal diffusion in hydrogen-helium mixtures

FOM, Laboratorium voor Massascheiding, Kruislaan 407, Amsterdam. O., R. F. A..

Abstract

Relative thermal diffusion factors of the binary systems ⁴He — HT, ⁴He — DT and ⁴He — T₂ are measured in a thermal diffusion column at three temperatures 325 °K, 355 °K and 390 °K.

The experiments show that in this small region a temperature dependence exists, which cannot be explained with the Chapman — Enskog theory.

Moreover, the experiments suggest that the diffusion coefficient of the ⁴He — HT mixture is much smaller than of the ⁴He — DT and ⁴He — T₂ systems.