J. Chim. Phys.
Volume 60, 1963
|Page(s)||172 - 177|
|Published online||28 May 2017|
Thermal diffusion in hydrogen-helium mixtures
FOM, Laboratorium voor Massascheiding, Kruislaan 407, Amsterdam. O., R. F. A..
Relative thermal diffusion factors of the binary systems 4He — HT, 4He — DT and 4He — T2 are measured in a thermal diffusion column at three temperatures 325 °K, 355 °K and 390 °K.
The experiments show that in this small region a temperature dependence exists, which cannot be explained with the Chapman — Enskog theory.
Moreover, the experiments suggest that the diffusion coefficient of the 4He — HT mixture is much smaller than of the 4He — DT and 4He — T2 systems.
© Paris : Société de Chimie Physique, 1963